Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs) are semiconductor devices widely employed in electronic equipment for the control of current flow. However, in practical applications, MOSFETs may experience various failure modes, with Electrostatic Overstress (EOS) failure being the most prevalent. EOS failure occurs when the MOSFET’s internal structure is damaged due to excessive voltage or current, rendering the device incapable of functioning correctly. This article will delve into the different modes of EOS failure, explore their causes, and discuss methods to differentiate EOS failures arising from various reasons.

I. Modes of EOS Failure

1. Gate Oxide Breakdown: Excessive voltage may lead to the breakdown of the gate oxide layer, compromising insulation between the gate and source, thereby affecting the normal operation of the device.
2. Drain Avalanche Breakdown: High voltage or current can induce avalanche effects in the drain region, reducing the breakdown voltage between the drain and source and impacting the device’s normal operation.
3. Hot Carrier Injection: When subjected to high current, the internal carriers generate heat, causing hot carrier injection into the gate region. This phenomenon lowers the MOSFET’s threshold voltage, affecting the device’s normal operation.
4. Gate Charge Loss: Excessive voltage or current can result in the loss of gate charge within the MOSFET, rendering the device non-functional.

II. Causes of EOS Failure

1. Unreasonable Design Parameters: The design parameters of MOSFETs, such as threshold voltage and breakdown voltage, determine their performance under high voltage or current conditions. If these parameters are unreasonable, MOSFETs may experience excessive voltage or current in practical applications, leading to EOS failure.
2. Manufacturing Process Defects: The manufacturing process significantly influences MOSFET performance. Defects in the manufacturing process can cause MOSFETs to withstand excessive voltage or current, resulting in EOS failure.
3. Excessive Temperature: The operating temperature of MOSFETs is crucial to their performance. Operating MOSFETs at excessively high temperatures may cause structural changes, contributing to EOS failure.
4. External Circuit Malfunctions: External circuits, such as drive circuits and protection circuits, have a significant impact on MOSFET operation. Malfunctions in external circuits may subject MOSFETs to excessive voltage or current, leading to EOS failure.

III. Differentiating EOS Failure Causes

1. Failure Mode Analysis: Observing the failure mode of MOSFETs (e.g., gate oxide breakdown, drain avalanche breakdown) can provide initial insights into the cause of EOS failure. For instance, gate oxide breakdown may indicate exposure to excessive voltage, while drain avalanche breakdown may suggest exposure to excessive current.
2. Inspecting Design Parameters: Checking MOSFET design parameters (e.g., threshold voltage, breakdown voltage) can further identify the cause of EOS failure. Unreasonable design parameters may lead to MOSFETs experiencing excessive voltage or current in practical applications, while manufacturing process defects may result in unstable MOSFET performance, leading to EOS failure.
3. Analyzing Working Environment: Analyzing the working environment and conditions of MOSFETs (e.g., temperature, humidity) can further identify the cause of EOS failure. For example, operating MOSFETs at excessively high temperatures may cause structural changes leading to EOS failure, while external circuit malfunctions may subject MOSFETs to excessive voltage or current.
4. Testing and Verification: Conducting tests and verification on failed MOSFETs (e.g., electrical characteristic tests, reliability tests) can provide additional insights into the cause of EOS failure. For example, testing MOSFET electrical characteristics (e.g., threshold voltage, breakdown voltage) can determine whether the device experienced excessive voltage or current. Reliability tests (e.g., lifetime tests, accelerated lifetime tests) can assess whether EOS failure occurred due to prolonged operation under harsh conditions.

In conclusion, EOS failure in MOSFETs is a common failure mode, and its causes may include unreasonable design parameters, manufacturing process defects, excessive temperature, and external circuit malfunctions. By analyzing failure modes, inspecting design parameters, analyzing the working environment, and conducting tests and verification, it is possible to effectively differentiate EOS failures caused by various reasons, providing a basis for improving design and enhancing device reliability.

Source: https://www.slw-ele.com/failure-modes-and-causes-of-eos-in-mosfets-differentiating-and-addressing-issues.html